Stereo-Selective Synthesis of exo-Norbornene Derivatives for Resist Materials.
نویسندگان
چکیده
منابع مشابه
Novel Resist Materials for next Generation Lithography
........................................................................................................................................................ ii Acknowledgments ....................................................................................................................................... iii Publications............................................................................
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2009
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.22.365