Spatial Distribution of Plasma Parameters in Microwave Plasma Chemical Vapor Deposition

Microwave Plasma Assisted Chemical Vapor Deposition of Diamond

Diamond crystal S and p01 ycrystal l i ne diamond fi lms have been depos i e y t h e microwave plasma ass i s t ed C V D method from C H / H mixtures. The i n: :oncentration of methane, the pressure, the temperatu$e, 'the to ta l flow ra t e and the microwave power were varied in large ranges. The morphology of the deposits were s tudied by op t i ca l and scanning e l ec t ron microscopy and t...

Nitrogen-doped graphene by microwave plasma chemical vapor deposition

Available online 6 November 2012

Determination of Optical Properties in Germanium Carbon Coatings Deposited by Plasma Enhanced Chemical Vapor Deposition

In this research, Germanium-carbon coatings were deposited on ZnS substrates by plasma enhanced chemical vapor deposition (PECVD) using GeH4 and CH4 precursors. Optical parameters of the Ge1-xCx coating such as refractive index, Absorption coefficient, extinction coefficient and band gap were measured by the Swanepoel method based on the transmittance spectrum. The results showed that the refra...

High Rate Deposition of Hydrogenated Amorphous Silicon Using Microwave Plasma Chemical Vapor Deposition Process

Pulsed DC- Plasma Assisted Chemical Vapor Deposition of α-rich Nanostructured Tantalum Film: Synthesis and Characterization

This paper is an attempt to synthesize nanostructured tantalum films on medical grade AISI 316L stainless steel (SS) using pulsed DC plasma assisted chemical vapor deposition (PACVD). The impact of duty cycle (17-33%) and total pressure (3-10 torr) were studied using field emission scanning electron microscopy (FESEM), grazing incidence x-ray diffraction (GIXRD), nuclear reaction analysis (NRA)...