Sparse ellipsometry

Application of spectroscopic ellipsometry and Mueller ellipsometry to optical characterization.

This article provides a brief overview of both established and novel ellipsometry techniques, as well as their applications. Ellipsometry is an indirect optical technique, in that information about the physical properties of a sample is obtained through modeling analysis. Standard ellipsometry is typically used to characterize optically isotropic bulk and/or layered materials. More advanced tec...

Entangled-photon ellipsometry

Performing reliable measurements in optical metrology, such as those needed in ellipsometry, requires a calibrated source and detector, or a wellcharacterized reference sample. We present a novel interferometric technique to perform reliable ellipsometric measurements. This technique relies on the use of a non-classical optical source, namely polarization-entangled twin photons generated by spo...

Modulated generalized ellipsometry

Spectroscopic ellipsometry study

The dielectric functions of InP, IIla.53 Gao.47 As, and 1110.75 Gao.2S Aso.s P 0.5 epitaxial layers have been measured using a polarization-modulation spectroscopic ellipsometer in the 1.5 to 5.3 eV region. The oxide removal procedure has been carefully checked by comparing spectroscopic ellipsometry and x-ray photoelectron spectroscopy measurements. These reference data have been used to inves...

ellipsometry and Mueller matrix polarimetry

We characterized two samples consisting of photoresist layers on silicon with square arrays of square holes by spectroscopic ellipsometry (SE) and Mueller matrix polarimetry (MMP). Hole lateral dimensions and depths were determined by fitting either SE data taken in conventional planar geometry or MMP data in general conical diffraction configurations. A method for objective determination of th...