Single-color peripheral photoinhibition lithography of nanophotonic structures

Abstract Advances in direct laser writing to attain super-resolution are required improve fabrication performance and develop potential applications for nanophotonics. In this study, a novel technique using single-color peripheral photoinhibition lithography was developed the resolution of while preventing chromatic aberration characteristics conventional multicolor lithography, thus offering robust tool fabricating 2D 3D nanophotonic structures. A minimal feature size 36 nm 140 were achieved with speed that at least 10 times faster than existing lithography. Super-resolution fast scanning enable spin-decoupled metasurfaces visible range within printing duration few minutes. Finally, subwavelength photonic crystal near-ultraviolet structural color fabricated demonstrate printing. This is flexible reliable ultracompact optical devices.