Single-atom catalysts by the atomic layer deposition technique
نویسندگان
چکیده
منابع مشابه
Stabilizing Single-Atom and Small-Domain Platinum via Combining Organometallic Chemisorption and Atomic Layer Deposition
Oxide-supported single-atom Pt materials are prepared by combining surface organometallic chemisorption with atomic layer deposition (ALD). Here Pt is supported as a discrete monatomic “pincer” complex, stabilized by an atomic layer deposition (ALD) derived oxide overcoat, and then calcined at 400 °C under O2. ALD-derived Al2O3, TiO2, and ZnO overlayers are effective in suppressing Pt sintering...
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Department of Mechanical and Materials Engineering, the University of Western Ontario, London, Ontario, N6A 5B9, Canada, Institut National de la Recherche Scientifique-Énergie, Matériaux et Télécommunications, Varennes, QC J3X 1S2, Canada, Canadian Centre for Electron Microscopy, McMaster University, Hamilton L8S 4M1, Canada, Brockhouse Institute for Materials Research, McMaster University, Ham...
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Three-dimensionally (3D) nanoarchitectured palladium/nickel (Pd/Ni) catalysts, which were prepared by atomic layer deposition (ALD) on high-aspect-ratio nanoporous alumina templates are investigated with regard to the electrooxidation of formic acid in an acidic medium (0.5 M H2SO4). Both deposition processes, Ni and Pd, with various mass content ratios have been continuously monitored by using...
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This letter demonstrates bi-layer channel Al-doped ZnO/ZnO thin film transistors (AZO/ZnO TFTs) via atomic layer deposition process at a relatively low temperature. The effects of annealing in oxygen atmosphere at different temperatures have also been investigated. The ALD bi-layer channel AZO/ZnO TFTs annealed in dry O2 at 300 °C exhibit a low leakage current of 2.5 × 10-13A, I on/I off ratio ...
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ژورنال
عنوان ژورنال: National Science Review
سال: 2018
ISSN: 2095-5138,2053-714X
DOI: 10.1093/nsr/nwy054