Single atom catalyst by atomic layer deposition technique
نویسندگان
چکیده
منابع مشابه
Stabilizing Single-Atom and Small-Domain Platinum via Combining Organometallic Chemisorption and Atomic Layer Deposition
Oxide-supported single-atom Pt materials are prepared by combining surface organometallic chemisorption with atomic layer deposition (ALD). Here Pt is supported as a discrete monatomic “pincer” complex, stabilized by an atomic layer deposition (ALD) derived oxide overcoat, and then calcined at 400 °C under O2. ALD-derived Al2O3, TiO2, and ZnO overlayers are effective in suppressing Pt sintering...
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Department of Mechanical and Materials Engineering, the University of Western Ontario, London, Ontario, N6A 5B9, Canada, Institut National de la Recherche Scientifique-Énergie, Matériaux et Télécommunications, Varennes, QC J3X 1S2, Canada, Canadian Centre for Electron Microscopy, McMaster University, Hamilton L8S 4M1, Canada, Brockhouse Institute for Materials Research, McMaster University, Ham...
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This letter demonstrates bi-layer channel Al-doped ZnO/ZnO thin film transistors (AZO/ZnO TFTs) via atomic layer deposition process at a relatively low temperature. The effects of annealing in oxygen atmosphere at different temperatures have also been investigated. The ALD bi-layer channel AZO/ZnO TFTs annealed in dry O2 at 300 °C exhibit a low leakage current of 2.5 × 10-13A, I on/I off ratio ...
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UNLABELLED The structure of vertically aligned carbon nanotubes (CNTs) severely depends on the properties of pre-prepared catalyst films. Aiming for the preparation of precisely controlled catalyst film, atomic layer deposition (ALD) was employed to deposit uniform Fe(2)O(3) film for the growth of CNT arrays on planar substrate surfaces as well as the curved ones. Iron acetylacetonate and ozone...
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ژورنال
عنوان ژورنال: Chinese Journal of Catalysis
سال: 2017
ISSN: 1872-2067
DOI: 10.1016/s1872-2067(17)62903-6