Silver Oxide Films Fabricated by Plasma Assisted Deposition

Deposition and characterization of SnO2:Sb thin films fabricated by the spray pyrolysis method

In this study, thin films of transparent semiconductor tin oxide doped with antimony impurities on the glass substrates with different concentrations of antimony that have been prepared using spray pyrolysis method. The effects of different concentration of antimony on the structural, optical, and electrical properties of the thin films were investigated. Prepared layers were characterized by X...

Lithium manganese oxide films fabricated by electron beam directed vapor deposition

Lithium manganese oxide thin films have been grown using a gas jet based, electron beam directed vapor deposition technique. The deposition rate could be controlled by the electron beam power as well as the gas jet density and speed. This enabled films to be grown at deposition rates up to 16 nm /s which is a significantly higher deposition rate than that reported for the growth of this materia...

Two-Stage Chemical Deposition of Oxide Films

Two-stage chemical deposition (TSCD) technique is used to produce ZnO, Mn2O3 and NiO films on soda-lime glass (SL-G) from an aqueous solution of zinc, manganese and nickel complex, respectively. The TSCD method enables the deposition of metal oxide thin films with a thickness which can be controlled during the preparation procedure. The ZnO, Mn2O3 and NiO thin films were polycrystalline films w...

Fatigue mechanism of yttrium-doped hafnium oxide ferroelectric thin films fabricated by pulsed laser deposition.

Owing to their prominent stability and CMOS compatibility, HfO2-based ferroelectric films have attracted great attention as promising candidates for ferroelectric random-access memory applications. A major reliability issue for HfO2 based ferroelectric devices is fatigue. So far, there have been a few studies on the fatigue mechanism of this material. Here, we report a systematic study of the f...

Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes