Siloxane Copolymers for Nanoimprint Lithography

Siloxane Copolymers for Nanoimprint Lithography**

Nanoimprint lithography (NIL) is a fabrication technology that offers high-throughput, ultrahigh resolution patterning at great cost savings compared to most competing next-generation radiative lithography methods. As a result of its rapid development in the past decade and its potential for sub-100 nm lithography, NIL has been listed by MIT’s Technology Review as one of ten emerging technologi...

Nanoimprint lithography

Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...

Nanoimprint Lithography

The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...

Nanoimprint lithography for nanodevice fabrication

Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL p...

Advanced Lithography: Nanoimprint Lithography for Semiconductor and Interconnect Technologies