Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process
نویسندگان
چکیده
منابع مشابه
Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption
The etching of silicon by a chlorine inductively coupled plasma ~ICP! was studied using laser desorption laser-induced fluorescence ~LD-LIF! analysis to determine the surface coverage of chlorine during steady-state etching. Laser interferometry was used to measure etch rates, and optical emission actinometry and Langmuir probe analysis were used to characterize the plasma. The ICP operated in ...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
سال: 2011
ISSN: 2166-2746,2166-2754
DOI: 10.1116/1.3628593