Results from experiments on hybrid plasma immersion ion implantation/nitriding processing of materials
نویسندگان
چکیده
منابع مشابه
Semiconductor applications of plasma immersion ion implantation
Plasma immersion ion implantation (PIII) is an established technique in certain niche microelectronics applications such as the synthesis of silicon-oninsulator. In other applications such as shallow junction formation by plasma doping, trench doping, and fabrication of blue light emitting materials, PIII has unique advantages over conventional techniques and may be the technique of choice in t...
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In plasma immersion ion implantation (PIII), a high voltage pulsed bias is applied to a substrate to accelerate ions from a surrounding plasma for implantation beneath the surface. This technique is often used to modify the surface properties of materials. For example, the intrinsic stress of thin films can be lowered, resulting in improved adhesion. For conducting samples, the energy of the in...
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ژورنال
عنوان ژورنال: Brazilian Journal of Physics
سال: 2004
ISSN: 0103-9733
DOI: 10.1590/s0103-97332004000800023