Resist Removal after Photolithography Process Using Adhesive Tape
نویسندگان
چکیده
منابع مشابه
Circuit-board Mounting Using Double-sided Adhesive Tape
In this paper, a method of using double-sided adhesive tape when mounting microwave circuit-boards is discussed. In particular, one type of adhesive tape with good features is described. The tapemounting is simple and fast to use and it is cheap. The tape that was used is soft and it can handle both high and low temperatures. These two features make the tape useful in places where parts with di...
متن کاملPrecise Protein Photolithography (P3): High Performance Biopatterning Using Silk Fibroin Light Chain as the Resist
Precise patterning of biomaterials has widespread applications, including drug release, degradable implants, tissue engineering, and regenerative medicine. Patterning of protein-based microstructures using UV-photolithography has been demonstrated using protein as the resist material. The Achilles heel of existing protein-based biophotoresists is the inevitable wide molecular weight distributio...
متن کاملFunctional results after tape removal for chronic pelvic pain following tension-free vaginal tape or transobturator tape.
PURPOSE The incidence of pelvic pain after placement of a suburethral sling for incontinence ranges between 0% and 30%. The management of this chronic pain after suburethral sling placement is complex and to our knowledge no consensus has been reached. We evaluated the functional results after removal of the suburethral tape responsible for chronic pelvic pain. MATERIALS AND METHODS From Nove...
متن کاملFunctional results after tape removal for chronic pelvic pain following tension-free vaginal tape or transobturator tape
and 49% were pN0 (p<0.001). The strongest predictor of progression and mortality was bGS. PSA >20 ng/ml associated with bGS /=8, PCSM was 35%. The main limitations of the study were retrospective design and varying treatment modalities. Conclusions: PCa patients with PSA >20 ng/ml have varying risk levels of disease progression and PC...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2008
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.21.21