Reports of 1995 TAPPI International Environmental Conference.

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In Proceedings of the 1995 International Conference on Logic Programming ,

The semantics of constraint logic programming languages with coroutining facilities (\freeze," suspension, residuation, etc.) cannot be fully declarative; thus, an operational semantics has to be taken as the deening one. We give a formal operational semantics for a Prolog-like language with cut and entailment-based conditional. The diiculty here is to present the semantics in a form that abstr...

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BLAST 1995: international conference on bacterial locomotion and signal transduction.

Joseph J. Falke,^* David F. Blair,^ Thomas J. Silhavy^ and Rijdiger Schmitt'' 'Department of Chemistry and Biochemistry, University of Cotorado, Boulder, Colorado 80309-0215. USA. ^Department of Biology, University of Utah, Salt Lake City, Utah 84112, USA. ^Department of Molecular Biology, Princeton University, Princeton, (Vew Jersey 08544, USA. '^Lehrstuhl fur Genetik, Universitat Regensburg, ...

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International Conference on Environmental Cadmium: an overview.

The International Conference on Environmental Cadmium was held June 7-9, 1978 on the NIH Campus in Bethesda, Maryland, to summarize the current level of scientific knowledge about cadmium as an environmental agent and to identify needed areas of research. The meeting was sponsored by the National Institute of Environmental Health Sciences and the Department of Environmental Hygiene, Karolinska ...

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International conference on environmental arsenic: an overview.

The National Institute of Environmental Health Sciences and the Department of Environmental Hygiene, Karolinska Institute, as Cooperating World Health Organization Centers in collaboration with the Scientific Commitee on the Toxicology of Metals under the Permanent Commission and International Association on Occupational Health, sponsored an International Conference on Arsenic October 5-8, 1976...

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Modelling of Resolution Enhancement Processes in Lithography - Microelectronics, 1995. Proceedings., 1995 20th International Conference on

This paper describes the modelling and simulation of two resolution enhancement techniques in lithography ; 1) phase shift mask (PSM) technology and 2) top surface imaging (TSI) with silylation and dry development. The effect of the duty ratio on the image contrast is computed. Simulated one and two dimensional rim shifters and attenuated PSMs are presented. The effect of the aerial image on th...

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ژورنال

عنوان ژورنال: JAPAN TAPPI JOURNAL

سال: 1995

ISSN: 0022-815X,1881-1000

DOI: 10.2524/jtappij.49.1800