Radiation-induced defect accumulation and annealing in Si-implanted gallium oxide

نویسندگان

چکیده

Defect accumulation and annealing phenomena in Si-implanted monoclinic gallium oxide (β-Ga 2 O 3 ) wafers, having [Formula: see text], (010), (001) orientations, were studied by Rutherford backscattering spectrometry channeling mode (RBS/c), x-ray diffraction (XRD), (scanning) transmission electron microscopy [(S)TEM]. Initially, the samples with different surface orientations implanted 300 keV 28 Si + -ions, applying fluences range of 1 × 10 14 –2 16 Si/cm , unveiling interesting disorder kinetics. In particular, RBS/c, XRD, (S)TEM combined data suggested that radiation buildup β-Ga is accompanied significant strain accumulation, assisting crystalline-to-crystalline phase transitions instead amorphization. Selected text] orientation subjected to isochronal (30 min) anneals 300–1300 °C air. Systematic RBS/c XRD characterization these complex structural transformations, which occurred as a function fluence temperature. Moreover, detailed analysis sample annealed at 1100 was enhanced dispersive energy-loss spectroscopies. The revealed silicon agglomerations form dioxide particles. Signal from also detected outside agglomerates, likely occurring substitutional on Ga sites.

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ژورنال

عنوان ژورنال: Journal of Applied Physics

سال: 2022

ISSN: ['1089-7550', '0021-8979', '1520-8850']

DOI: https://doi.org/10.1063/5.0083858