Progress of thiol-amine ‘alkahest’ solutions for thin film deposition

Binary thiol-amine mixtures termed ‘alkahests’ possess high solvent power for an assortment of bulk solids, such as metals and metal chalcogenides, under mild conditions. The resulting inks are used in the solution deposition chalcogenide thin films a variety applications. molecular solutes from dissolution solid precursors affect film quality; it is therefore important to identify them effectively tailor ink compositions optimization. Thiol-amine solutions have closed gap with hydrazine-processed devices, favorable efficiencies solar cells thermoelectric devices. been leveraged other areas, engineering surfaces nanocrystals. Solution has garnered interest replacement vacuum techniques due its scalability lower cost. While hydrazine processing offered alternative deposition, commercialization limited toxicity explosive nature. (‘alkahests’) proven usage wide range inexpensive solids give inks. Intensive studies dissolution, solute speciation, decomposition mechanisms bridged quality between vacuum-deposited films, but analogous nascent. Here, we outline recent progress made identifying solutions. New applications potential areas future study highlighted.