Preparation of Titania Nanotube Thin films by Anodizing
نویسندگان
چکیده
منابع مشابه
Piezoelectric Polymeric Thin Films Tuned by Carbon Nanotube Fillers
Piezoelectric materials have received considerable attention from the smart structure community because of their potential use as sensors, actuators and power harvesters. In particular, polyvinylidene fluoride (PVDF) has been proposed in recent years as an enabling material for a variety of sensing and energy harvesting applications. In this study, carbon nanotubes (CNT) are included within a P...
متن کاملarchitecture and engineering of nanoscale sculptured thin films and determination of their properties
چکیده ندارد.
15 صفحه اولAl Doped ZnO Thin Films; Preparation and Characterization
ZnO is a promising material suitable for variety of novel electronic applications including sensors, transistors, and solar cells. Intrinsic ZnO film has inferiority in terms of electronic properties, which has prompted researches and investigations on doped ZnO films in order to improve its electronic properties. In this work, aluminum (Al) doped ZnO (AZO) with various concentrations and undop...
متن کاملPreparation of Titania Foams
± [1] C. T. Kresge, M. E. Leonowickz, W. J. Roth, J. S. Beck, Nature 1992, 359, 710. [2] J. S. Beck, J. C. Vartuli, W. J. Roth, M. E. Leonowicz, C. T. Kresge K. D. Schmitt, C. T.-W. Chu, D. H. Olson, E. W. Sheppard, S. B. McCullen, J. B. Higgins, J. L. Shlenker, J. Am. Chem. Soc. 1992, 114, 10 834. [3] Q. Huo, D. Margolese, U. Ciesla, D. G. Demuth, P. Fenf, T. E. Gier, P. Gier, A. Firousi, B. F...
متن کاملStructural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films
Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Korean Chemical Engineering Research
سال: 2011
ISSN: 0304-128X
DOI: 10.9713/kcer.2011.49.1.028