Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes
نویسندگان
چکیده
منابع مشابه
Low-pressure CVD and Plasma- Enhanced CVD
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
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ژورنال
عنوان ژورنال: Journal of Thermal Spray Technology
سال: 2011
ISSN: 1059-9630,1544-1016
DOI: 10.1007/s11666-011-9702-5