Pathway-engineering for highly-aligned block copolymer arrays
نویسندگان
چکیده
منابع مشابه
Evolution of block copolymer lithography to highly ordered square arrays.
The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography spontaneously yield nanometer-sized hexagonal structures, but these features are not consistent wi...
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ژورنال
عنوان ژورنال: Nanoscale
سال: 2018
ISSN: 2040-3364,2040-3372
DOI: 10.1039/c7nr06069f