Path planning of mechanical polishing process for freeform surface with a small polishing tool

Track Planning and Pressure Control of Robotic Gasbag Polishing Technique with Improved Polishing Tool

In order to obtain well-proportioned surface quality and high polishing efficiency of free-form mould, a robotic gasbag polishing technique using an improved spinning-inflated-gasbag polishing tool is proposed in this paper. The improved polishing tool consists of three detachable modules, which are the drive, soft rubber gasbag and magnetorheology. The six degrees of freedom industrial robot w...

Chemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide--mirror polishing and surface properties.

Chemical mechanical polishing (CMP) of cpTi (Ti) was carried out using two types of slurries, acidic and basic colloidal silica containing H2O2 up to 3 wt%, to obtain flat and mirror-polished surfaces without any contaminated and reacted layers. Polishing behavior and surface properties were investigated using AFM, EPMA, and XPS. Weight loss of Ti polished by CMP using the basic slurry was larg...

Process modeling for robotic polishing

This paper presents the solutions adopted for a robotic polishing cell for mold manufacturing. Mold finishing is frequently carried out manually; these kinds of operations are iterative, time consuming and require experience. Automation can introduce cost reduction minimizing production times on such manual finishing operations. The research shown in this paper provides an overall solution with...

Device independent process control of dielectric chemical mechanical polishing

The use of the chemical-mechanical polishing (CMP) process in the semiconductor industry is growing rapidly, and it is a critical step in the manufacturing of integrated circuits. The CMP process is complicated by many factors, and controlling all of these factors in a single controller has been unrealistic. One of the most significant factors complicating control is the dependency of the polis...

Laser Assisted Chemical Mechanical Polishing for Planarization