Parallelization of thermochemical nanolithography

Parallelization of thermochemical nanolithography.

One of the most pressing technological challenges in the development of next generation nanoscale devices is the rapid, parallel, precise and robust fabrication of nanostructures. Here, we demonstrate the possibility to parallelize thermochemical nanolithography (TCNL) by employing five nano-tips for the fabrication of conjugated polymer nanostructures and graphene-based nanoribbons.

Plasmonic Nanolithography

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well be...

Thermochemical studies of pyrazolide.

The 351.1 nm photoelectron spectrum of 1-pyrazolide anion has been measured. The 1-pyrazolide ion is produced by hydroxide (HO(-)) deprotonation of pyrazole in a flowing afterglow ion source. The electron affinity (EA) of the 1-pyrazolyl radical has been determined to be 2.938 +/- 0.005 eV. The angular dependence of the photoelectrons indicates near-degeneracy of low-lying states of 1-pyrazolyl...

"Dip-Pen" nanolithography

A direct-write "dip-pen" nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode. An atomic force microscope (AFM) tip is used to write alkanethiols with 30-nanometer linewidth resolution on a gold thin film in a manner analogous to that of a dip pen. Molecules are delivered from the AFM tip to a solid substrate of interest via capillary transpor...

Nanolithography: Written with light.