Organic-Inorganic Hybrid Type Electron Beam Resist.

Electron Transport and Spin Phenomena in Hybrid Organic/inorganic Systems

Dit proefschrift is goedgekeurd door de promotoren: Prof. dr. ir. Front: Photograph of rubrene single-crystal (partly) overlapping with Co/Al 2 O 3 electrodes and the molecule structure of rubrene (top), and the schematic picture of a monolayer of the molecules [Co(tpy)(tpy-SH)] 2+ and [Zn(tpy)(tpy-SH)] 2+ on gold (bottom). Back: Photograph of Co/Al 2 O 3 structures, representing two electrons ...

Photochromic organic–inorganic hybrid materialsw

Organic/inorganic hybrid as anticratering agent in cathodicelectrocoating

An improved aqueous electrocoating composition containing an anticrater additive which is a reaction product of silane component based on glycidoxy propyl tri methoxysilane and poly oxy propylene diamine. Materials were studied by infrared spectroscopy and particle size analyzer. Crater number of electrocoated sample was evaluated by GM9532p standard. The final electrocoat contains anticrater a...

Electron beam lithography on irregular surfaces using an evaporated resist.

An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces...

Polystyrene negative resist for high-resolution electron beam lithography

We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL) resist, with the goal of finding the ultimate achievable resolution. It demonstrated fairly well-defined patterning of a 20-nm period line array and a 15-nm period dot array, which are the densest patterns ever achieved using organic EBL resists. Such dense patterns can be ach...