Optimization of 193 nm Contact Hole Resists for 100 nm Node.
نویسندگان
چکیده
منابع مشابه
Photodissociation of propargyl chloride at 193 nm.
The photodissociation of propargyl chloride (C3H3Cl) has been studied at 193 nm. Ion imaging experiments with state-selective detection of the Cl atoms and single-photon ionization of the C3H3 radicals were performed, along with measurements of the Cl + C3H3 and HCl + C3H2 recoil kinetic energy distributions, using a scattering apparatus with electron bombardment ionization detection to resolve...
متن کاملPhotodissociation dynamics of ClN3 at 193 nm.
Photofragment translational spectroscopy was used to identify the primary and secondary reaction pathways in 193 nm photodissociation of chlorine azide (ClN(3)) under collision-free conditions. Both the molecular elimination (NCl+N(2)) and the radical bond rupture channel (Cl+N(3)) were investigated and compared with earlier results at 248 nm. The radical channel strongly dominates, just as at ...
متن کاملMeasurements of detector nonlinearity at 193 nm.
We have developed a measurement system based on a correlation method to characterize the nonlinearity of a detector's response over a large range of laser pulse energy. The system consists of an excimer-laser source, beam-shaping optics, a beam splitter, a monitor detector, a set of optical filters, and the detector under test. Detector nonlinearities as large as 10% or greater over an entire m...
متن کاملPhotodissociation of isobutene at 193 nm.
The collisionless photodissociation dynamics of isobutene (i-C(4)H(8)) at 193 nm via photofragment translational spectroscopy are reported. Two major photodissociation channels were identified: H + C(4)H(7) and CH(3) + CH(3)CCH(2). Translational energy distributions indicate that both channels result from statistical decay on the ground state surface. Although the CH(3) loss channel lies 13 kca...
متن کاملSingle Layer Fluoropolymer Resists for 157 nm Lithography
We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of 1) tetrafluoroethylene (TFE), 2) a norbornene fluoroalcohol (NBFOH), and 3) t-butyl acrylate (t-BA). TFE incorporation reduces optical absorbance at 157 nm, while the presence of a norbornene functionalized with hexafluoroisopropanol groups contributes to aqueous base (developer) solubility and e...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2002
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.15.549