Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition

Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films

The plasmonic behavior of Ag thin films produced by plasma enhanced atomic layer deposition (PEALD) has been investigated. We show that as-deposited flat PEALD Ag films exhibit unexpected plasmonic properties, and the plasmonic enhancement can differ markedly, depending on the microstructure of the Ag film. Electromagnetic field simulations indicate that this plasmonic behavior is due to air ga...

Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition

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Mechanical properties of atomic layer deposition-reinforced nanoparticle thin films.

Nanoparticle thin films (NTFs) exhibit multifunctionality, making them useful for numerous advanced applications including energy storage and conversion, biosensing and photonics. Poor mechanical reliability and durability of NTFs, however, limit their industrial and commercial applications. Atomic layer deposition (ALD) represents a unique opportunity to enhance the mechanical properties of NT...

Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, ...

Optical properties of boron carbide (B5C) thin films fabricated by plasma-enhanced chemical-vapor deposition