On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles
نویسندگان
چکیده
منابع مشابه
On the Deposition Rate of Magnetron Sputtered Thin Films at Oblique Angles
We describe the magnetron sputtering deposition of thin films at oblique angles. A general relation between the deposition rate of the film and experimental parameters such as gas pressure or substrate tilt angle is deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key magnitude...
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ژورنال
عنوان ژورنال: Plasma Processes and Polymers
سال: 2014
ISSN: 1612-8850
DOI: 10.1002/ppap.201300201