Novel Photoacid Generators for Chemically Amplified Resists

3-D Diffusion Models for Chemically-Amplified Resists Using Massively Parallel Processors

Three-dimensional concentration dependent diffusions and simultaneous chemical reactions in chemically-amplified photoresists are simulated. Fickian, a linearly increasing diffusivity and an exponentially increasing diffusivity due to free volume increase with T-BOC are considered. Two different grid to processor mappings are proposed in implementing the simulator on massively parallel processo...

Microwave-Assisted Formation of Sulfonium Photoacid Generators

Characterization of novel sulfonium photoacid generators and their microwave-assisted synthesis.

Microwave-assisted synthesis of triarylsulfonium salt photoacid generators (PAGs) afforded reaction times 90 to 420 times faster than conventional thermal conditions, with photoacid quantum yields of new sulfonium PAGs ranging from 0.01 to 0.4.

Effects of photoacid generator incorporation into the polymer main chain on 193nm chemically amplified resist behavior and lithographic performance

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Acid-Quencher Reaction-Diffusion during the Post-Exposure Bake of Chemically Amplified Resists Part 1: Initially linear concentration profiles