Ni/Al multilayer reactions on nanostructured silicon substrates

Abstract Fast energy release, which is a fundamental property of reactive multilayer systems, can be used in wide field applications. For most applications, self-propagating reaction and adhesion between the multilayers substrate are necessary. In this work, distinct approach for achieving reactions deposited Ni/Al silicon demonstrated. The surface consists random structures, referred to as grass, were created by deep ion etching. Using etching process, structure units heights 8 13 µm density 0.5 3.5 structures per 2 formed. Ni Al layers alternatingly stoichiometric ratio 1:1 using sputtering, achieve total thickness 5 µm. analysis phase transformation was done with high-speed camera, pyrometer, X-ray diffractometer. Cross-sectional showed that grew only on top grass form inversed cones, enabled reacted multilayers. A achieved, due thermally isolating air pockets present around these cones. velocity temperature varied according morphology. parameters decreased increasing height decreasing structures. To analyze exact influence morphology, further investigations needed.