Ni80Fe20 nanodisks by nanosphere lithography for biomedical applications

Nanosphere Lithography for Nitride Semiconductors

Tunable multiband metasurfaces by moiré nanosphere lithography.

Moiré nanosphere lithography (MNSL), which features the relative in-plane rotation between two layers of self-assembled monodisperse nanospheres as masks, provides a cost-effective approach for creating moiré patterns on generic substrates. In this work, we experimentally and numerically investigate a series of moiré metasurfaces by MNSL. Due to the variety of gradient plasmonic nanostructures ...

Fabrication of nanopillars by nanosphere lithography

A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere e...

Moiré Nanosphere Lithography.

We have developed moiré nanosphere lithography (M-NSL), which incorporates in-plane rotation between neighboring monolayers, to extend the patterning capability of conventional nanosphere lithography (NSL). NSL, which uses self-assembled layers of monodisperse micro/nanospheres as masks, is a low-cost, scalable nanofabrication technique and has been widely employed to fabricate various nanopart...

Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explor...