Nanospheres Lithography: Recent Advances of Nanospheres Lithography in Organic Electronics (Small 28/2021)

Orthogonal Lithography for Organic Electronics CNF

We introduce a new class of photo-electron-beam resists and solvents which are benign to organic electronic materials. We demonstrate that our patterning approach enables the fabrication of unique organic electronic devices, such as all organic thin film transistors, patterned light emitting diode displays and top-contact small channel length thin film transistors. Summary of Research: Organic ...

Recent Advances in Step and Flash Imprint Lithography

The goal of the Step and Flash Imprint Lithography (SFIL) development program is to enable patterning of sub-100 nm features in a manner that has dramatic cost savings over conventional projection lithography techniques. The SFIL process is performed at room temperature and with minimal applied pressure, and we believe the use of low viscosity materials and photopolymerization chemistry will en...

Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography

Immersion interferometric lithography has been applied successfully to semiconductor device applications, but its potential is not limited to this application only. This paper explores this imaging technology for the production of threedimensional nano-structures using a 193 nm excimer laser and immersion Talbot interferometric lithographic tool. The fabrication of 3-D photonic crystals for the...

Recent Trends in Optical Lithography

VOLUME 14, NUMBER 2, 2003 LINCOLN LABORATORY JOURNAL 221 O  ,   of patterning, has enabled semiconductor devices to progressively shrink since the inception of integrated circuits more than three decades ago. Throughout the 1980s and 1990s, the trend of miniaturization continued unabated and even accelerated. Current semiconductor devices are being mass produced wi...

ALTERNATIVE LITHOGRAPHY STRATEGIES for FLEXIBLE ELECTRONICS