Multilayer plasma patterns in atmospheric pressure glow discharges

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Atmospheric pressure plasma of dielectric barrier discharges*

The dielectric barrier discharge (DBD) has a number of industrial applications and has been a subject of research for many years. Many studies have been carried out to understand the underlying DBD physics. Despite the fact that much progress has been made, some important issues are still far from being clear. In this work, we summarize the basics of DBD physics and introduce innovative concept...

متن کامل

Pulsed RF discharges, glow and filamentary mode at atmospheric pressure in argon

The properties of a pulsed radio frequency capacitive discharge are investigated at atmospheric pressure in argon. The discharge can operate in two different modes: a homogeneous glow discharge or turn into filaments. By pulsing the 13.56 MHz generator both the filamentary and the glow modes can be selected depending on the pulse width and period. For a 5μs pulse width (∼70 RF cycles in the pul...

متن کامل

One-dimensional simulation of multi pulse phenomena in dielectric-barrier atmospheric-pressure glow discharges

The dielectric-barrier configuration is commonly used to generate uniform, highly non-equilibrium atmospheric-pressure glow discharges. Although recent research has improved our understanding of these discharges, several questions relating to the structure and transient characteristics of the discharge remain to be answered. We employ a self-consistent, one-dimensional, model to simulate these ...

متن کامل

Introduction to Low Pressure Glow Discharges for Semiconductor Manufacturing with special Emphasis on Plasma Etching

Plasma processing is one of the key technologies in the fabrication of modern silicon devices. It is applied to approximately one third of the several hundred fabrication steps. Plasma etching enables together with advanced lithography the high volume production of submicron structures. The significant difference to the formerly used wet etching in liquid chemicals is its ability to keep the ma...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: IEEE Transactions on Plasma Science

سال: 2005

ISSN: 0093-3813

DOI: 10.1109/tps.2005.845113