Modeling solvent dynamics in polymers with solvent-filled cavities
نویسندگان
چکیده
منابع مشابه
Dynamics of polymers in a particle-based mesoscopic solvent.
We study the dynamics of flexible polymer chains in solution by combining multiparticle-collision dynamics (MPCD), a mesoscale simulation method, and molecular-dynamics simulations. Polymers with and without excluded-volume interactions are considered. With an appropriate choice of the collision time step for the MPCD solvent, hydrodynamic interactions build up properly. For the center-of-mass ...
متن کاملStretched polymers in a poor solvent.
Stretched polymers with attractive interaction are studied in two and three dimensions. They are described by biased self-avoiding random walks with nearest-neighbor attraction. The bias corresponds to opposite forces applied to the first and last monomers. We show that both in d=2 and d=3 a phase transition occurs as this force is increased beyond a critical value, where the polymer changes fr...
متن کاملComputer simulation of bottle-brush polymers with flexible backbone: good solvent versus theta solvent conditions.
By molecular dynamics simulation of a coarse-grained bead-spring-type model for a cylindrical molecular brush with a backbone chain of N(b) effective monomers to which with grafting density σ side chains with N effective monomers are tethered, several characteristic length scales are studied for variable solvent quality. Side chain lengths are in the range 5 ≤ N ≤ 40, backbone chain lengths are...
متن کاملAnisotropic colloidal particles interacting with polymers in a good solvent.
We study the consequences of chain self-avoidance for the interaction between nonadsorbing polymers and colloidal particles of anisotropic shape, such as ellipsoids, lenses, and dumbbells. In the framework of a field theoretic operator expansion for small mesoscopic particles, we obtain exact results for self-avoiding polymers in d=2 spatial dimensions and we compare ideal and self-avoiding pol...
متن کاملModeling Solvent Diffusion in Photoresist
A semi-empirical study into the effects of residual casting solvent on the lithographic properties of photoresist is described. Solvent content of a commercial i-line photoresist after post apply bake has been measured using a quartz crystal microbalance and using radio-labeled solvent with scintillation counting. Analysis of this data has led to a calibrated model of solvent diffusivity as a f...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Mechanics of Soft Materials
سال: 2020
ISSN: 2524-5600,2524-5619
DOI: 10.1007/s42558-020-00029-0