Metal mesh electrode array fabricated by plate-to-roll nanoimprint lithography
نویسندگان
چکیده
منابع مشابه
A review of roll-to-roll nanoimprint lithography
UNLABELLED Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands...
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The ability of microto nanometer-scale patterning on flexible substrates can enable many new applications in the area of photonics and organic electronics. A major roadblock has remained for many practical applications of patterned nanostructures, which is the throughput of nanopattern replication and the associated cost issues. Among the emerging techniques, nanoimprint lithography (NIL) clear...
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ژورنال
عنوان ژورنال: SN Applied Sciences
سال: 2020
ISSN: 2523-3963,2523-3971
DOI: 10.1007/s42452-020-1958-2