Luminescent YbVO4 by atomic layer deposition

Atomic layer deposition: an overview.

Atomic Layer Deposition of TiO

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Robust, functional nanocrystal solids by infilling with atomic layer deposition.

Thin films of colloidal semiconductor nanocrystals (NCs) are inherently metatstable materials prone to oxidative and photothermal degradation driven by their large surface-to-volume ratios and high surface energies. (1) The fabrication of practical electronic devices based on NC solids hinges on preventing oxidation, surface diffusion, ripening, sintering, and other unwanted physicochemical cha...

ceramic surface modification of textiles by atomic layer deposition

24 Nanoscale ceramic surface modification of textiles by atomic layer deposition R ecent opportunities to merge traditional inorganic materials processing with organic fibrous textiles are creating new possibilities in electrical, optical and mechanical applications for textiles. Textiles are made of low-cost natural or synthetic fibers and have unique flexibility, strength and durability with ...

Ultrathin oxide films by atomic layer deposition on graphene.

In this paper, a method is presented to create and characterize mechanically robust, free-standing, ultrathin, oxide films with controlled, nanometer-scale thickness using atomic layer deposition (ALD) on graphene. Aluminum oxide films were deposited onto suspended graphene membranes using ALD. Subsequent etching of the graphene left pure aluminum oxide films only a few atoms in thickness. A pr...