Low temperature photoionized Ne plasmas induced by laser-plasma EUV sources
نویسندگان
چکیده
منابع مشابه
Diagnostics for laser plasma EUV sources
A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the princi...
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ژورنال
عنوان ژورنال: Laser and Particle Beams
سال: 2015
ISSN: 0263-0346,1469-803X
DOI: 10.1017/s026303461500021x