Low residual stress in hydrogenated amorphous silicon-carbon films deposited by low-temperature PECVD
نویسندگان
چکیده
منابع مشابه
Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon
Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under va...
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We report on a novel optical thin film material, erbium-doped deuterated amorphous carbon, fabricated directly on silicon substrate at room-temperature via controlled thermal evaporation of a Metal-Organic compound in a Plasma-Enhanced Chemical Vapour Deposition (MO-PECVD) system. High erbium concentrations (up to 2.3 at.%) and room-temperature photoluminescence at 1.54 microm are successfully ...
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Using real-time spectroscopic ellipsometry (RTSE) the evolution of the surface roughness in aSi:H thin-films grown by low-temperature plasma-enhanced chemical vapor deposition (PECVD) has been studied as a function of the hydrogen dilution ratio Rd =[H2]/[SiH4] with 15 ≤ Rd ≤ 60. To describe the roughness evolution, we have used a 3D linearized continuum equation which includes a negative surfa...
متن کاملOn the surface roughness development of hydrogenated amorphous silicon deposited at low growth rates
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We have shown that close to stoichiometry RF PECVD amorphous silicon carbon alloys deposited under silane starving plasma conditions exhibit a tendency towards c-SiC chemical order. Motivated by this trend, we further explore the e ect of increasing RF power and H2 dilution of the gaseous mixtures, aiming to obtain the amorphous counterpart of c-SiC by the RF-PECVD technique. Doping experiments...
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ژورنال
عنوان ژورنال: Journal of Materials Research and Technology
سال: 2019
ISSN: 2238-7854
DOI: 10.1016/j.jmrt.2019.09.026