Low-impedance internal linear inductive antenna for large-area flat panel display plasma processing

Transparent Fingerprint Sensor System for Large Flat Panel Display

In this paper, we introduce a transparent fingerprint sensing system using a thin film transistor (TFT) sensor panel, based on a self-capacitive sensing scheme. An armorphousindium gallium zinc oxide (a-IGZO) TFT sensor array and associated custom Read-Out IC (ROIC) are implemented for the system. The sensor panel has a 200 × 200 pixel array and each pixel size is as small as 50 μm × 50 μm. The...

Flexible Flat Panel Display Technology

The manufacturing of flat panel displays is a dynamic and continuously evolving industry. Improvements of flat panel displays are made rapidly as technology improves and new discoveries are made by display scientists and engineers. The cathode ray tube and active matrix liquid crystal display (LCD) recently celebrated their 100th and 25th anniversary, respectively. The arrival of portable elect...

Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source

A large area antenna generates a plasma by both inductive and capacitive coupling; it is an electromagnetically coupled plasma source. In this work, experiments on a large area planar RF antenna source are interpreted in terms of a multi-conductor transmission line coupled to the plasma. This electromagnetic treatment includes mutual inductive coupling using the complex image method, and capaci...

New Process Monitoring Strategies for Large Area Panel Processing

This paper presents new process monitoring strategies for low cost high density substrates manufactured on large area panels. By increasing the panel size from today’s 4 × 4 inch up to 24 × 24 inch, the EU LAP project is reaching the costs target of US$1/inch for MCM-D substrates. But therefore it is essential to keep the substrate yield on large panels as high as on small panels. With this goa...

Antenna configuration for uniform large-area inductively coupled plasma production