Loss-coupled DFB nano-ridge laser monolithically grown on a standard 300-mm Si wafer

نویسندگان

چکیده

We present a loss-coupled distributed feedback microlaser, monolithically grown on standard 300-mm Si wafer using nano-ridge engineering. The cavity is formed by integrating metallic grating top of the nano-ridge. This allows forming laser without etching III-V material, avoiding damaged interfaces and associated carrier loss. Simulations, supported experimental characterisation modal gain devices, predict an optimal duty cycle for ~0.4, providing good trade-off between coupling strength loss lasing mode. model was experimentally verified characterising threshold external efficiency devices exhibiting gratings with varying cycle. high low obtained prove excellent quality epitaxial material. Furthermore, metal might provide future route to electrical injection efficient heat dissipation these nanoscale devices.

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ژورنال

عنوان ژورنال: Optics Express

سال: 2021

ISSN: ['1094-4087']

DOI: https://doi.org/10.1364/oe.422245