Liquid Phase Deposition of Tin Oxide Thin Films
نویسندگان
چکیده
منابع مشابه
Atomic Layer Deposition of Tin Monosulfide Thin Films
Thin film solar cells made from earth-abundant, non-toxic materials are needed to replace the current technology that uses Cu(In,Ga)(S,Se)2 and CdTe, which contain scarce and toxic elements. One promising candidate absorber material is tin monosulfide (SnS). In this report, pure, stoichiometric, single-phase SnS films were obtained by atomic layer deposition (ALD) using the reaction of bis(N,N’...
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The authors present a new method for preparing thin films of SnO2 by atomic layer deposition ALD using alternating exposures to tetrakis dimethylamino tin and hydrogen peroxide. This method avoids problems of corrosion and agglomeration associated with the halogenated compound, SnCl4. Tin oxide films were successfully deposited on a variety of substrates using deposition temperatures of 50–300 ...
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ژورنال
عنوان ژورنال: Journal of The Surface Finishing Society of Japan
سال: 2004
ISSN: 0915-1869
DOI: 10.4139/sfj.55.60