منابع مشابه
TCAD News, September 2007
The first article presents a complete TCAD flow for typical high-performance 45-nm CMOS technologies, such as the ones being readied for production at major foundries and integrated device manufacturers around the world. This work incorporates approaches to simulate innovative process steps such as laser annealing and high-k gate dielectrics, a necessity in the continual challenge to contain sh...
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As new materials and novel device designs are needed to further CMOS and memorydevice scaling, a range of advanced physical models has been added to TCAD Sentaurus Version A-2008.09 to allow users to explore these technology options. While high-k dielectrics and metal gate stacks are more widely adopted, further optimization is necessary to ensure its production worthiness and high yield. It is...
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ژورنال
عنوان ژورنال: Microscopy Today
سال: 2021
ISSN: ['2150-3583', '1551-9295']
DOI: https://doi.org/10.1017/s1551929521001000