In situ Sintering of Agglomerated 3% Yttria-stablized Zirconia
نویسندگان
چکیده
منابع مشابه
Effect of impurities on sintering and conductivity of yttria-stabilized zirconia
The effect of low concentrations of Fe203, AI203 and Bi203 on the sintering behaviour of (ZrO2)o.83 (YO1.s)o.17, made by alkoxide synthesis, has been investigated. The best results are achieved with Bi203 as a sinter agent and a relative density of 95% is obtained at 1200 K. The effects of these impurities on the electrical conductivity of the bulk and the grain boundaries has been investigated...
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,]u amlll'slS tS prt 'seulud o / gralu ,t~lO111/i tllld th'll,~l~COtl/m o/ r t t r la-cr l lo ,~_taluh:t'd tetlagOlla/ .llT'Ollltl Imlrcrrstal,~ ' ( ] ' , ( ' e ' I 'ZPs) u,~'lllg both i,~'/~thrrllla[ alld IlOll-I,~'otllerllla/ Icl']llllqllr,~ T/lu ch/Ir tl¢'lt'rlSlll'S O/ )', Ct' 'I~ZP.~ ' or'(' i'olup, lred 11/ thosr o/ )'. F Z f ' uud C~'. T'Z[' aud the 1'/-/('('t o/lul'r/'a,~lu,t~ i'~'l'lU ...
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Chemical vapor deposition (CVD) is an important step in integrated circuit fabrication and is a dynamic process that is complex and subject to unmeasured disturbances. Currently in semiconductor industry the main form of advanced process control for CVD is run-to-run (R2R) control. R2R control is a form of discrete process control in which the processing recipe is modified ex situ based on post...
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ژورنال
عنوان ژورنال: Microscopy and Microanalysis
سال: 2014
ISSN: 1431-9276,1435-8115
DOI: 10.1017/s143192761400988x