Improved AlScN/GaN heterostructures grown by metal-organic chemical vapor deposition

نویسندگان

چکیده

Abstract AlScN/GaN epitaxial heterostructures have raised much interest in recent years, because of the high potential such structures for high-frequency and high-power electronic applications. Compared to conventional AlGaN/GaN heterostructures, spontaneous piezoelectric polarization AlScN can yield a five-time increase sheet carrier density two-dimensional electron gas formed at heterointerface. Very promising radio-frequency device performance has been shown on samples deposited by molecular beam epitaxy. Recently, demonstrated, which were processed more industrial compatible growth method metal-organic chemical vapor deposition (MOCVD). In this work, SiN x passivated MOCVD-grown with improved structural quality developed. Analytical transmission microscopy, secondary ion mass spectrometry high-resolution x-ray diffraction analysis indicate presence undefined interfaces between layers an uneven distribution Al Sc layer. However, AlScN-based high-electron-mobility transistors (HEMT) fabricated compared AlN/GaN HEMTs. The characteristics HEMT are promising, showing transconductance close 500 mS mm ?1 drain current above 1700 mA .

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ژورنال

عنوان ژورنال: Semiconductor Science and Technology

سال: 2021

ISSN: ['0268-1242', '1361-6641']

DOI: https://doi.org/10.1088/1361-6641/abd924