منابع مشابه
LATTICE SITES OF ION IMPLANTED Cu ATOMS IN DIAMOND
Radioactive Cu atoms were accelerated to 60 keV at the online isotope separator ISOLDE at CERN, and implanted into a type IIa natural diamond sample to a dose of 2 x 10 cm. The channeling of β particles and conversion electrons emitted in the decay of Cu and Zn*, respectively, were monitored about the three major axial directions with a two dimensional position-sensitive detector. The electron ...
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We have studied arsenic (As) diffusion and its electrical activation in two different types of silicon substrates: bulk Si and separation by implanted oxygen (SIMOX) wafers. Both substrates were implanted with a dose of 531014 cm−2 As+ at 20 keV. The samples were annealed and physical characterization was performed with secondary ion mass spectrometry (SIMS), Rutherford backscattering spectrome...
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ژورنال
عنوان ژورنال: Science
سال: 2013
ISSN: 0036-8075,1095-9203
DOI: 10.1126/science.340.6130.250-d