Impact of deposition conditions on nanostructured anisotropic silica thin films in multilayer interference coatings

Recent developments of nanostructured coatings have reached a point where extensive investigations within multi-layer systems are necessary for further implementation in novel photonic systems. Although sculptured thin films explored decades, no optical and structural measurements been performed anisotropic with different deposition conditions the dense layer. In this paper, we present morphological analysis on silica films. Changing angle from 66° to 84°, indicate changes surface filling 84% 57%, respectively, while phase retardance has maximal value 0.032°/nm at 70° 72° angles. We also investigation covering such structures layer conditions. As result, technology maintaining initial properties is developed extending spectral difference 1.6 times retardation by 5% coatings. Furthermore, simulations growing using experimental Virtual Coater framework resulting virtual comparison measurements. The minimal impact anisotropy porous 30° during constant substrate rotation.