Hole doping in a negative charge transfer insulator
نویسندگان
چکیده
Abstract R E NiO 3 is a negative charge transfer energy system and exhibits temperature-driven metal-insulator transition (MIT), which also accompanied by bond disproportionation (BD) transition. In order to explore how hole doping affects the BD transition, we have investigated electronic structure of single-crystalline thin films Nd 1− x Ca synchrotron based experiments ab-initio calculations. Here show that for small value , doped holes are localized on one or more Ni sites around dopant 2+ ions, while state rest lattice remains intact. The effective (Δ) increases with concentration formation phase not favored above critical suppressing insulating phase. Our present study firmly demonstrates appearance mode essential MIT series.
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ژورنال
عنوان ژورنال: Communications physics
سال: 2022
ISSN: ['2399-3650']
DOI: https://doi.org/10.1038/s42005-022-00993-1