History and current status of commercial pulsed laser deposition equipment

Pulsed Laser Deposition and Epitaxy

Laser is a powerful tool in many applications. It is especially useful in material processing. Thanks to it's narrow frequency bandwidth, coherence and high power density this instrument is used in many scientific research works and experiments. Often the light beam is intense enough to vaporize the hardest and most heat resistant materials. Besides, due to its high precision, reliability and s...

Pulsed Laser Deposition of SiO

Thin films of bioactive glass-ceramic have been deposited on titanium substrates by the Pulsed Laser Deposition (PLD) technique under different experimental conditions. The effect of parameters such as deposition pressure and temperature of heat treatments was studied. The microstructure and the crystalline phases of the coatings were characterized using SEM, EDX and XRD analysis; the phases pr...

Pulsed Laser Deposition of Oxides

As a materials processing technique, laser ablation was utilized for the first time in the 1960's, after the first commercial ruby laser was invented. Nevertheless, as a thin film growth method it did not attract much research interest until the late 1980 ́s, when it has been used for growing high temperature superconductor films. Since then, the development of the pulsed laser deposition (PLD) ...

Pulsed laser deposition of liquid crystals

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Pulsed Laser Deposition of Hydroxyapatite Thin Films