Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

نویسندگان

چکیده

The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. chemical properties assessed energy dispersive X-ray spectroscopy hard photoelectron measurements, while current – voltage dielectric breakdown capacitance analysis is undertaken provide information these films for first time. success challenges in formation polymer VPI, compatibility pyridine such role, ability unique rapid grafting-to brush method forming coherent metal oxides evaluated. It was found that VPI made at temperatures between 200 250 °C had consistent field, with best performing devices possessing ? value 5.9. results indicate approach allows creation display comparable quality PEALD grown films.

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ژورنال

عنوان ژورنال: Microelectronic Engineering

سال: 2022

ISSN: ['1873-5568', '0167-9317']

DOI: https://doi.org/10.1016/j.mee.2022.111888