Fast point spread function modeling with deep learning
نویسندگان
چکیده
منابع مشابه
Modeling of EUV photoresists with a resist point spread function
Extreme ultraviolet (EUV) lithography is under development for possible deployment at the 32-nm technology node. One active area of research in this field is the development of photoresists that can meet the stringent requirements (high resolution, high sensitivity, low LER, etc.) of lithography in this regime. In order to facilitate research in this and other areas related to EUV lithography, ...
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ژورنال
عنوان ژورنال: Journal of Cosmology and Astroparticle Physics
سال: 2018
ISSN: 1475-7516
DOI: 10.1088/1475-7516/2018/07/054