Fabrication of ultrasmall magnets by electroplating
نویسندگان
چکیده
منابع مشابه
Fabrication of ultrasmall magnets by electroplating
We use high voltage electron beam lithography followed by electroplating to define small metal features on semiconductor substrates. These have been used to form high resolution etch masks, dense nanomagnet arrays, and highly anisotropic metal nanostructures. To reproducibly obtain uniform arrays of such structures, we have developed an end-point detection technique, which is based on in situ o...
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We demonstrated a practical process of fabricating nickel molds for nanoimprinting. Dual-side polished glass is chosen as the substrate on which nickel nanostructures are successfully electroplated. Photonic crystal structures with 242 nm diameters and other nanoscale pillars down to 9 nm diameters are achieved over a large area. The electroplating parameters are investigated and optimized. Thi...
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Group III–nitride semiconductors and their ternary solid solutions are very promising as the candidates for both short wavelength optoelectronics and power electronic devices (Nakamura et al. 1997; Nakamura et al. 1995; Lee, et al. 2010; Youn, et al. 2004). The AlGaN/GaN heterostructure field effect transistors (HFETs) have a great potential for future high-frequency and high-power applications...
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The authors report a method for monitoring, control, and end-point detection of electroplating in nanostructures. The method is demonstrated on nickel plating into polymer molds, which is an important process in the fabrication of soft x-ray zone-plate diffractive optics. The lack of reproducibility presently limits the achievable nickel aspect ratio and, thus, reduces the zone-plate diffractio...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
سال: 1995
ISSN: 0734-211X
DOI: 10.1116/1.588076