Fabrication of porous silicon nitride with high porosity by diatomite
نویسندگان
چکیده
منابع مشابه
Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a mask
A method to fabricate nano-ridges over a full wafer is presented. The fabrication method uses local oxidation of silicon, with silicon nitride as a mask, and wet anisotropic etching of silicon. The realized structures are 7–20 nm wide, 40–100 nm high and centimeters long. All dimensions are easily adjustable by varying the oxidation time, the wet etching time and the mask geometry, respectively...
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plasma-sprayed silicon layers have been used to produce silicon nitride layers with fibrous microstructure which optimizes fracture toughness and strength. SEM examination of the specimens shows that the surface is covered by fine needles and whiskers of Si3N4.In order to study the oxygen contamination effect as well as other contaminants introduced during spraying and nitridation processes, su...
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ژورنال
عنوان ژورنال: Procedia Engineering
سال: 2012
ISSN: 1877-7058
DOI: 10.1016/j.proeng.2011.12.521