Fabrication of Moth-eye Antireflective Nanostructures via Oxygen Ion-beam Etching on a UV-curable Polymer

نویسندگان

چکیده

We report a low-cost, high-throughput process for fabricating moth-eye-like anti-reflector on curved surface. First, surface was made from UV-curable resin via UV imprinting. Then, the structures were formed directly polymer oxygen ion-beam etching. This produced flexible, transparent, and products with anti-reflective properties. The method avoids duplication, which is generally needed conventional fabrication. compared performance both flat lenses before after reflectance etching 150 s substantially 10% lower than that of non-etched usefulness this optical properties demonstrated.

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ژورنال

عنوان ژورنال: Journal of Photopolymer Science and Technology

سال: 2021

ISSN: ['0914-9244', '1349-6336']

DOI: https://doi.org/10.2494/photopolymer.34.133