Extraction of Perchlorate Using Porous Organosilicate Materials

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Extraction of Perchlorate Using Porous Organosilicate Materials

Sorbent materials were developed utilizing two morphological structures, comprising either hexagonally packed pores (HX) or a disordered pore arrangement (CF). The sorbents were functionalized with combinations of two types of alkylammonium groups. When capture of perchlorate by the sorbents was compared, widely varying performance was noted as a result of differing morphology and/or functional...

متن کامل

Electrocatalysis using porous nanostructured materials.

The performance of electrochemical reactions depends strongly on the morphology and structure of the employed catalytic electrodes. Nanostructuring of the electrode surface represents a powerful tool to increase the electrochemically active surface area of the electrodes. Moreover, it can also facilitate faster diffusive mass transport inside three-dimensional electrodes. This minireview descri...

متن کامل

Plasma damage effects on low-k porous organosilicate glass

Damage induced in low-k porous organosilicate glass SiCOH dielectric films by exposure to an electron cyclotron resonance ECR plasma was investigated. The effects of charged-particle bombardment and vacuum ultraviolet radiation were separated. Flux measurements showed that the ECR plasma has a greater photon flux in the vacuum ultraviolet VUV range than in the UV range. Damage was measured by e...

متن کامل

Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation

vacuum ultraviolet irradiation H. Zheng, S. W. King, V. Ryan, Y. Nishi, and J. L. Shohet Plasma Processing & Technology Laboratory, Department of Electrical & Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA Logic Technology Development, Intel Corporation, Hillsboro, Oregon 97124, USA GLOBALFOUNDRIES, Albany, New York 12203, USA Stanford University, Stanford,...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Materials

سال: 2013

ISSN: 1996-1944

DOI: 10.3390/ma6041403