EUV Patterning Strategy compensating EUV Shot Noise

Approach to EUV Lithography Simulation

Which solar EUV indices are best for reconstructing the solar EUV irradiance ?

Reflectivity degradation of grazing-incident EUV mirrors by EUV exposure and carbon contamination

Reflectivity degradation of grazing-incident extreme ultraviolet (EUV) mirror samples by EUV exposure was investigated in a commercial XTS 13-35 EUV source. The roughness of EUV exposed samples increases with an increase in exposure time due to the erosion of sample surface by ions and neutrals, or deposition of contaminant such as carbon on the sample surface. While energetic debris certainly ...

Imaging Three-Dimensional Heliosphere in EUV

The glow of interstellar plasma and solar wind pickup ions and solar wind emissions at 30.4 nm provide a way of exploring important physical processes in the heliosphere. Imaging the heliosphere at this wavelength with high spectral resolution will map the heliopause, probe pickup ions in the solar wind, and reveal the three-dimensional flow pattern of the solar wind, including in the regions o...

Report on EUV resist and process limitations

EUV lithography (λ=13.4nm) has been identified as one of the technologies likely to succeed to 193nm lithography for the definition of ever-smaller transistor architectures. Whether EUV in the end will outrank competing technologies for the 32nm and 22nm nodes (Hyper NA immersion, maskless, nanoimprint) and whether EUV will make it to mass production of integrated circuits will depend on both E...